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Determination of the Distribution of Ion Implantation Boron in Silicon
Wang, Te-Sheng, Cullis, A.G., Collart, E.J.H., Murrell, A.J., Foad, M.A.Volume:
647
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-647-o14.3/r9.3
Date:
January, 2000
File:
PDF, 357 KB
english, 2000