Ultra-Thin Zirconium Silicate Filmsc With Good Physical And Electrical Properties For Gate Dielectric Applications
Dharmarajan, Easwar, Qi, Wen-Jie, Nieh, Renee, Kang, Laegu, Onishi, Katsunori, Lee, Jack C.Volume:
648
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-648-p6.16
Date:
January, 2000
File:
PDF, 371 KB
english, 2000