Doping process issues for Sub-0.1 μm generation MOSFETs

MRS Proceedings 2001 / 1 Vol. 669

Doping process issues for Sub-0.1 μm generation MOSFETs

Sugii, Toshihiro, Pidin, Sergey, Momiyama, Youichi, Goto, Ken- ichi, Tanaka, Takuji, Yamamoto, Tomonari, Futatugi, Toshirou, Kase, Masatak
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Volume:
669
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-669-j1.2
Date:
January, 2001
File:
PDF, 1.13 MB
english, 2001
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