Modeling of Boron Implantation Into Si With Decaborane Ions

MRS Proceedings 2001 / 1 Vol. 669

Modeling of Boron Implantation Into Si With Decaborane Ions

Insepov, Zinetulla, Sosnowski, Marek, Yamada, Isao
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Volume:
669
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-669-j4.19
Date:
January, 2001
File:
PDF, 348 KB
english, 2001
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