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Ultra-Thin Zirconium Oxide Films Deposited by Rapid Thermal Chemical Vapor Deposition (RT-CVD) as Alternative Gate Dielectric
Chang, Jane P., Lin, You-ShengVolume:
670
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-670-k1.4
Date:
January, 2001
File:
PDF, 9.11 MB
english, 2001