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Promising Gate Stacks with Ru & RuO2 Gate Electrodes and Y-silicate Dielectrics
Zhong, Huicai, Heuss, Greg, Suh, You-Seok, Hong, Shin-Nam, Misra, Veena, Kelly, Jason, Parsons, GregoryVolume:
670
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-670-k3.1
Date:
January, 2001
File:
PDF, 527 KB
english, 2001