Electricaland Structural Characteristics Of Ultra-Thin...

MRS Proceedings 2001 / 1 Vol. 670

Electricaland Structural Characteristics Of Ultra-Thin TiO2/Ti-Si-O Stacked Gate Insulator Formed by Rf Sputtering Technique

Koyama, M., Kaneko, A., Koike, M., Fujiwara, I., Yabuki, M., Yoshiki, M., Koike, M., Nishiyama, A.
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Volume:
670
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-670-k4.7
Date:
January, 2001
File:
PDF, 136 KB
english, 2001
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