Dual Work Function CMOS Gate Technology Based on Metal Interdiffusion
Polishchuk, Igor, Ranade, Pushkar, King, Tsu-Jae, Hu, ChenmingVolume:
670
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-670-k5.1
Date:
January, 2001
File:
PDF, 114 KB
english, 2001