Analysis of CMP planarization performance for STI process

MRS Proceedings 2001 / 1 Vol. 671

Analysis of CMP planarization performance for STI process

Tsujimura, Manabu, Corporation, Ebara, Ohta-ku, Kamata, Japan, Tokyo
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Volume:
671
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-671-m3.6
Date:
January, 2001
File:
PDF, 209 KB
english, 2001
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