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Modeling of Pattern Dependencies for Multi-Level Copper Chemical-Mechanical Polishing Processes
Tugbawa, Tamba, Park, Tae, Lee, Brian, Boning, DuaneVolume:
671
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-671-m4.3
Date:
January, 2001
File:
PDF, 41 KB
english, 2001