Multi-Scale Simulations of Silicon Etching by Halides:...

MRS Proceedings 2001 / 1 Vol. 677

Multi-Scale Simulations of Silicon Etching by Halides: Effects of Surface Reaction Rates.

Kratzer, Matthias, Steinhögl, Werner, Kersch, Alfred, Sachse, Tanja, Höink, Volker
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Volume:
677
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-677-aa5.6
Date:
January, 2001
File:
PDF, 989 KB
english, 2001
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