Growth of 3C-SiC Layers on Silicon Substrates with a Novel Stress Relaxation Structure
Irokawa, Yoshihiro, Yamada, Noboru, Kodama, Masahito, Kachi, TetsuVolume:
680
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-680-e3.11
Date:
January, 2001
File:
PDF, 857 KB
english, 2001