Fabrication of 0.1 µm channel diamond Metal-Insulator-Semiconductor Field-Effect Transistor
Umezawa, Hitoshi, Ohba, Yoshikazu, Ishizaka, Hiroaki, Arima, Takuya, Taniuchi, Hirotada, Tachiki, Minoru, Kawarada, HiroshiVolume:
680
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-680-e8.2
Date:
January, 2001
File:
PDF, 233 KB
english, 2001