Fabrication of 0.1 µm channel diamond...

Fabrication of 0.1 µm channel diamond Metal-Insulator-Semiconductor Field-Effect Transistor

Umezawa, Hitoshi, Ohba, Yoshikazu, Ishizaka, Hiroaki, Arima, Takuya, Taniuchi, Hirotada, Tachiki, Minoru, Kawarada, Hiroshi
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Volume:
680
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-680-e8.2
Date:
January, 2001
File:
PDF, 233 KB
english, 2001
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