Scatterometry for Lithography Process Control and...

MRS Proceedings 2001 / 1 Vol. 692

Scatterometry for Lithography Process Control and Characterization in IC Manufacturing

Kostoulas, Yiorgos, Raymond, Christopher J.
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Volume:
692
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-692-h5.2.1
Date:
January, 2001
File:
PDF, 233 KB
english, 2001
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