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Spectroscopic Ellipsometry as a Potential In-Line Optical Metrology Tool For Relative Porosity Measurements of Low- K Dielectric Films
Edwards, N.V., Vella, J., Xie, Q., Zollner, S., Werho, D., Adhihetty, I., Liu, R., Tiwald, T.E., Russell, C., Vires, J., Junker, K.H.Volume:
697
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-697-p4.7
Date:
January, 2001
File:
PDF, 153 KB
english, 2001