Deposition and Characterization of PECVD SiOC Films by Using Bistrimethylsilylmethane (BTMSM) Precursor
Kim, Yoon-Hae, Hwang, Moo Sung, Lee, Young, Kim, Hyeong JoonVolume:
714
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-714-l7.12.1
Date:
January, 2001
File:
PDF, 397 KB
english, 2001