The Element Depth Profiles in Ultrathin Silicon Oxynitride Films
Asanov, Igor P., Choi, Jinhak, Chung, Youngsu, Choi, Jaemin, Lee, JaecheolVolume:
738
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-738-g7.41
Date:
January, 2002
File:
PDF, 70 KB
english, 2002