The Effect of Channel-Protect Oxide on Laser Recrystallized...

MRS Proceedings 1986 / 1 Vol. 74

The Effect of Channel-Protect Oxide on Laser Recrystallized Silicon-on-insulator MOS devices.

Sritharan, S., Collins, G. J., Fukumoto, J., Szluk, N., Jones, K. M., Al-Jassim, M. M.
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Volume:
74
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-74-621
Date:
January, 1986
File:
PDF, 1009 KB
english, 1986
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