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Annealing Kinetics during Rapid and Classical Thermal Processing of Laser and Implantation Induced defects in Silicon
Adekoya, W. O., Muller, J. C., Siffert, P.Volume:
74
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-74-699
Date:
January, 1986
File:
PDF, 320 KB
english, 1986