Ion Implantation Effect on Dislocation Propagation in Pseudomorphically Strained P/P+ Silicon
Feichtinger, Petra, Poust, Ben, Fukuto, Hiroaki, Sandhu, Rajinder, Goorsky, Mark S., Oster, Dwain, Rickborn, Steve F., Moreland, JimVolume:
610
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-610-b6.10
Date:
January, 2000
File:
PDF, 1.32 MB
english, 2000