Physical and electrical characterization of the interface...

Microscopy and Microanalysis 2008 / 8 Vol. 14; Iss. S2

Physical and electrical characterization of the interface between atomic-layer-deposited Al2O3 on GaAs substrates for CMOS applications

Garcia-Gutierrez, DI, Kaushik, V, Shahrjerdi, D, Banerjee, S
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Volume:
14
Language:
english
Journal:
Microscopy and Microanalysis
DOI:
10.1017/s1431927608083001
Date:
August, 2008
File:
PDF, 1.67 MB
english, 2008
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