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The Integration of Interlayer Dielectric Deposition and Chemical Mechanical Polishing
McAfee, Anda, Koos, Daniel A., mcArdle, Stephen, Jacobs, Mercedes, Hiatt, RobertVolume:
477
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-477-109
Date:
January, 1997
File:
PDF, 1.15 MB
english, 1997