Challenges in Integrating the High-K Gate Dielectric Film...

MRS Proceedings 2001 / 1 Vol. 670

Challenges in Integrating the High-K Gate Dielectric Film to the Conventional Cmos Process Flow

Agarwal, Avinash, Freiler, Michael, Lysaght, Pat, Perrymore, Loyd, Bergmann, Renate, Sparks, Chris, Bowers, Bill, Barnett, Joel, Riley, Deborah, Kim, Yudong, Nguyen, Billy, Bersuker, Gennadi, Shero, E
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Volume:
670
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-670-k2.1
Date:
January, 2001
File:
PDF, 1.29 MB
english, 2001
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