Chemically Amplified Resist Approaches for E-beam Lithography Mask Fabrication
Maldonado, J.R., Angelopoulos, M., Huang, W., Brainard, R. L., Guevremont, J. M., Tan, Z.Volume:
705
Language:
english
Journal:
MRS Proceedings
DOI:
10.1557/proc-705-y1.3
Date:
January, 2001
File:
PDF, 2.27 MB
english, 2001