Reaction Mechanism Underlying Atomic Layer Deposition of Antimony Telluride Thin Films
Han, Byeol, Kim, Yu-Jin, Park, Jae-Min, Yusup, Luchana L, Ishii, Hana, Lansalot-Matras, Clement, Lee, Won-JunVolume:
16
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.12270
Date:
May, 2016
File:
PDF, 1.12 MB
english, 2016