Reaction Mechanism Underlying Atomic Layer Deposition of...

Reaction Mechanism Underlying Atomic Layer Deposition of Antimony Telluride Thin Films

Han, Byeol, Kim, Yu-Jin, Park, Jae-Min, Yusup, Luchana L, Ishii, Hana, Lansalot-Matras, Clement, Lee, Won-Jun
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Volume:
16
Language:
english
Journal:
Journal of Nanoscience and Nanotechnology
DOI:
10.1166/jnn.2016.12270
Date:
May, 2016
File:
PDF, 1.12 MB
english, 2016
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