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Parameters, affecting the sensitivity of poly(methyl methacrylate) as a positive lithographic resist
Edward Gipstein, Augustus C. Ouano, Duane E. Johnson, Omar U. Need IIIVolume:
17
Year:
1977
Language:
english
Pages:
6
DOI:
10.1002/pen.760170613
File:
PDF, 496 KB
english, 1977