A polymer complex as a new type of electron beam resist for...

Polymer Engineering & Science 1988 Vol. 28; Iss. 14

A polymer complex as a new type of electron beam resist for dry development

Sachiko Yoneyama, Kiyoshi Oguchi, Masayoshi Watanabe, Kohei Sanui, Naoya Ogata, Yoichi Takahashi, Tomihiro Nakada
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Volume:
28
Year:
1988
Language:
english
Pages:
4
DOI:
10.1002/pen.760281406
File:
PDF, 364 KB
english, 1988
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