![](/img/cover-not-exists.png)
A negative resist for KrF excimer laser lithography
M. Toriumi, N. Hayashi, M. Hashimoto, S. Nonogaki, T. Ueno, T. IwayanagiVolume:
29
Year:
1989
Language:
english
Pages:
6
DOI:
10.1002/pen.760291308
File:
PDF, 545 KB
english, 1989