Role of annealing temperature in the oxide charge distribution in high-\(\kappa \)-based MOS devices: simulation and experiment
Biswas, Debaleen, Chakraborty, Ayan, Chakraborty, SupraticVolume:
15
Language:
english
Journal:
Journal of Computational Electronics
DOI:
10.1007/s10825-016-0829-y
Date:
September, 2016
File:
PDF, 1.14 MB
english, 2016