Poly(4-methylstyrene-co-chloromethylstyrene): A negative...

Polymer International 1992 Vol. 28; Iss. 3

Poly(4-methylstyrene-co-chloromethylstyrene): A negative electron beam resist—synthesis and lithography evaluation

Stanley Affrossman, Massoud Bakshaee, David Bramley, Fong Chow, Christopher Dix, Paul Hendy, Mervyn Jones, Anthony Ledwith, Margaret Mills, Phillip Miller Tate, Richard A. Pethrick
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Volume:
28
Year:
1992
Language:
english
Pages:
9
DOI:
10.1002/pi.4990280306
File:
PDF, 833 KB
english, 1992
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