Industrial high-rate (∼5 nm/s) deposited silicon nitride...

Progress in Photovoltaics: Research and Applications 2005 Vol. 13; Iss. 8

Industrial high-rate (∼5 nm/s) deposited silicon nitride yielding high-quality bulk and surface passivation under optimum anti-reflection coating conditions

B. Hoex, A. J. M. van Erven, R. C. M. Bosch, W. T. M. Stals, M. D. Bijker, P. J. van den Oever, W. M. M. Kessels, M. C. M. van de Sanden
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
13
Year:
2005
Language:
english
Pages:
8
DOI:
10.1002/pip.628
File:
PDF, 124 KB
english, 2005
Conversion to is in progress
Conversion to is failed