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Duty cycle control in reactive high-power impulse magnetron sputtering of hafnium and niobium
Ganesan, R, Treverrow, B, Murdoch, B, Xie, D, Ross, A E, Partridge, J G, Falconer, I S, McCulloch, D G, McKenzie, D R, Bilek, M M MVolume:
49
Language:
english
Journal:
Journal of Physics D: Applied Physics
DOI:
10.1088/0022-3727/49/24/245201
Date:
June, 2016
File:
PDF, 2.28 MB
english, 2016