Electroless Deposition of Copper-Manganese for Applications in Semiconductor Interconnect Metallization
Yu, Lu, Vashaei, Zahra, Ernst, Frank, Akolkar, RohanVolume:
163
Year:
2016
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/2.0631608jes
File:
PDF, 766 KB
english, 2016