Facile patterning silicon wafer by Rochow reaction over...

Applied Surface Science 2016 / 01 Vol. 360

Facile patterning silicon wafer by Rochow reaction over patterned Cu-based catalysts

Ren, Wenfeng, Wang, Yanhong, Zhang, Zailei, Tan, Qiangqiang, Zhong, Ziyi, Su, Fabing
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Volume:
360
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.10.233
Date:
January, 2016
File:
PDF, 2.58 MB
english, 2016
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