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EFFECT OF NITROGEN INCORPORATION ON ELECTRICAL PROPERTIES OF HIGH- K NANOMIXED Hf x Al y O z FILM CAPACITORS GROWN ON RU METAL ELECTRODES BY ATOMIC LAYER DEPOSITION
SEONG, NAK-JIN, YOON, SOON-GIL, YEOM, SEUNG-JIN, WOO, HYUN-KYUNG, KIL, DEOK-SIN, ROH, JAE-SUNG, SOHN, HYUN-CHULVolume:
74
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584580500414077
Date:
September, 2005
File:
PDF, 723 KB
english, 2005