SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2013)] Advances in Resist Materials and Processing Technology XXX - Study on dissolution behavior of polymer-bound and polymer-blended photo-acid generator (PAG) resists
Yamamoto, Hiroki, Kozawa, Takahiro, Tagawa, Seiichi, Somervell, Mark H.Volume:
8682
Year:
2013
Language:
english
DOI:
10.1117/12.2011636
File:
PDF, 269 KB
english, 2013