SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Mask error enhancement factor variation with pattern density
Kang, Hye-Young, Weed, J. Tracy, Martin, Patrick M., Kim, Sung-Hyuck, Lee, Chang-Ho, Oh, Hye-KeunVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.632408
File:
PDF, 210 KB
english, 2005