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SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Contact mask LER impact on lithographic performance
Nagatomo, Tatsuya, Hosono, Kunihiro, Yamana, Mitsuharu, Morinaga, Katsuhisa, Higuchi, Masaru, Sato, Shunsuke, Tanaka, TsuyoshiVolume:
7748
Year:
2010
Language:
english
DOI:
10.1117/12.866397
File:
PDF, 2.51 MB
english, 2010