Time Dependent Dielectric Breakdown in High Quality SiC MOS Capacitors
Chbili, Zakariae, Cheung, Kin P., Campbell, Jason P., Chbili, Jaafar, Lahbabi, Mhamed, Ioannou, Dimitris E., Matocha, KevinVolume:
858
Language:
english
Journal:
Materials Science Forum
DOI:
10.4028/www.scientific.net/MSF.858.615
Date:
May, 2016
File:
PDF, 685 KB
english, 2016