Gate patterning in 14nm and beyond nodes: from planar...

Applied Surface Science 2016 / 01 Vol. 362

Gate patterning in 14nm and beyond nodes: from planar devices to three dimensional Finfet devices

Meng, Lingkuan, Hong, Peizhen, He, Xiaobin, Li, Chunlong, Li, Junjie, Li, Junfeng, Zhao, Chao, Wei, Yayi, Yan, Jiang
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Volume:
362
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2015.11.139
Date:
January, 2016
File:
PDF, 2.62 MB
english, 2016
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