Effect of sputter deposited Zn precursor film thickness and...

Materials Science in Semiconductor Processing 2016 / 09 Vol. 52

Effect of sputter deposited Zn precursor film thickness and annealing time on the properties of Cu2ZnSnS4 thin films deposited by sequential reactive sputtering of metal targets

Singh, Om Pal, Muhunthan, Nadarajah, Gour, Kuldeep Singh, Parmar, Rahul, Dalai, Manas, Kulriya, Pawan, Pillai, Sujit, Singh, V.N.
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Volume:
52
Language:
english
Journal:
Materials Science in Semiconductor Processing
DOI:
10.1016/j.mssp.2016.05.012
Date:
September, 2016
File:
PDF, 1.71 MB
english, 2016
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