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Prediction of Total Dose Effects on Sub-Micron Process Metal Oxide Semiconductor Devices
KAMIMURA, Hiroshi, KATO, MasatakaVolume:
28
Language:
english
Journal:
Journal of Nuclear Science and Technology
DOI:
10.1080/18811248.1991.9731418
Date:
August, 1991
File:
PDF, 462 KB
english, 1991