Stability and extreme ultraviolet photo-reduction of...

Surface and Coatings Technology 2016 / 06 Vol. 296

Stability and extreme ultraviolet photo-reduction of graphene during C-K edge NEXAFS characterization

Gerlin, Francesca, Zuppella, Paola, Corso, Alain Jody, Nardello, Marco, Tessarolo, Enrico, Bacco, Davide, Pelizzo, Maria Guglielmina
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Volume:
296
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2016.04.030
Date:
June, 2016
File:
PDF, 1.18 MB
english, 2016
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