Negative-working photoresist of methacrylate polymers based...

Journal of Polymer Science Part A: Polymer Chemistry 2002 Vol. 40; Iss. 11

Negative-working photoresist of methacrylate polymers based on the transesterification of the 2-hydroxyethyl group in the presence of an acid

Jongsoo Lee, Toshiaki Aoai, Syun'ichi Kondo, Nobukazu Miyagawa, Shigeru Takahara, Tsuguo Yamaoka
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
40
Year:
2002
Language:
english
Pages:
10
DOI:
10.1002/pola.10252
File:
PDF, 262 KB
english, 2002
Conversion to is in progress
Conversion to is failed