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Etching effects to PZT capacitors with RuO x /Pt electrode by using inductively coupled plasma
Kim, Chang Jung, Lee, J. Key, Chung, C. Won, Chung, I.Volume:
16
Language:
english
Journal:
Integrated Ferroelectrics
DOI:
10.1080/10584589708013036
Date:
April, 1997
File:
PDF, 865 KB
english, 1997