![](/img/cover-not-exists.png)
Characterization of tunable band gap aluminum indium oxide films prepared on SiO2 (0001) by MOCVD
Du, Xuejian, Li, Zhao, Luan, Caina, Wang, Weiguang, Wang, Mingxian, Ma, JinVolume:
27
Language:
english
Journal:
Journal of Materials Science: Materials in Electronics
DOI:
10.1007/s10854-015-3794-5
Date:
January, 2016
File:
PDF, 1.59 MB
english, 2016