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[IEEE 2016 China Semiconductor Technology International Conference (CSTIC) - Shanghai, China (2016.3.13-2016.3.14)] 2016 China Semiconductor Technology International Conference (CSTIC) - PMA effects on Al/HfO2 high-K PMOS capacitors
Xiao, Lihong, Deng, Hao, Li, Fenglian, Qi, Jinhe, Zhao, Jian, Zhang, BeichaoYear:
2016
Language:
english
DOI:
10.1109/cstic.2016.7464016
File:
PDF, 737 KB
english, 2016