Improvement of the Polyimide Surface Wettability Using SiOx...

Plasma Processes and Polymers 2005 Vol. 2; Iss. 7

Improvement of the Polyimide Surface Wettability Using SiOx Films Deposited in a DECR Reactor from HMDSO/O2 Mixtures

Azzedine Bellel, Salah Sahli, Patrice Raynaud, Yvan Segui, Zahira Ziari, David Eschaich, Gilles Dennler
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Volume:
2
Year:
2005
Language:
english
Pages:
9
DOI:
10.1002/ppap.200500016
File:
PDF, 308 KB
english, 2005
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