Flux of Positive Ions and Film Growth in Reactive...

Plasma Processes and Polymers 2007 Vol. 4; Iss. Supplement

Flux of Positive Ions and Film Growth in Reactive Sputtering of Al-Doped ZnO Thin Films

Florian Ruske, Volker Sittinger, Wolfgang Werner, Bernd Szyszka, Ruben Wiese
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Volume:
4
Year:
2007
Language:
english
Pages:
1
DOI:
10.1002/ppap.200730904
File:
PDF, 210 KB
english, 2007
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