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Understanding the Roughening and Degradation of 193 nm Photoresist during Plasma Processing: Synergistic Roles of Vacuum Ultraviolet Radiation and Ion Bombardment
Dustin Nest, Ting-Ying Chung, David B. Graves, Sebastian Engelmann, Robert L. Bruce, Florian Weilnboeck, Gottlieb S. Oehrlein, Deyan Wang, Cecily Andes, Eric A. HudsonVolume:
6
Year:
2009
Language:
english
Pages:
9
DOI:
10.1002/ppap.200900039
File:
PDF, 692 KB
english, 2009